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Proceedings Paper

Overlay metrology performance prediction fidelity: the factors enabling a successful target design cycle
Author(s): Inna Tarshish-Shapir; Eitan Hajaj; Greg Gray; Jeffery Hodges; Jianming Zhou; Sarah Wu; Sam Moore; Guy Ben-Dov; Chen Dror; Ze'ev Lindenfeld; David Gready; Mark Ghinovker; Mike Adel
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Paper Abstract

Overlay metrology performances highly depend on the detailed design of the measured target. Hence performing simulations is an essential tool for optimizing target design. We demonstrate for scatterometry overlay (SCOL) three key factors which enable consistency in ranking between simulated and measured metrology performance for target design. The first factor, to enable high fidelity simulations for the purpose of target design, is stack and topography verification of model inputs. We report in detail the best known film metrology methods required to achieve model integrity. The second factor is the method of calculation of metrology performance metrics based on target cell reflectivities from electro-magnetic (EM) simulations. These metrics enable ranking of different designs, and subsequent choice of the best performing designs among all simulated design options, the ranking methodology being the third factor. We apply the above steps to a specific stack, where five different designs have been considered. Simulated versus measured values are compared. A good agreement between simulation and measurement is achieved.

Paper Details

Date Published: 24 March 2016
PDF: 13 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97782J (24 March 2016); doi: 10.1117/12.2219181
Show Author Affiliations
Inna Tarshish-Shapir, KLA-Tencor Corp. (Israel) (Israel)
Eitan Hajaj, KLA-Tencor Corp. (Israel) (Israel)
Greg Gray, KLA-Tencor Corp. (Idaho) (United States)
Jeffery Hodges, KLA-Tencor Corp. (Idaho) (United States)
Jianming Zhou, Micron Technology, Inc. (United States)
Sarah Wu, Micron Technology, Inc. (United States)
Sam Moore, Micron Technology, Inc. (United States)
Guy Ben-Dov, KLA-Tencor Corp. (Israel) (Israel)
Chen Dror, KLA-Tencor Corp. (Israel) (Israel)
Ze'ev Lindenfeld, KLA-Tencor Corp. (Israel) (Israel)
David Gready, KLA-Tencor Corp. (Israel) (Israel)
Mark Ghinovker, KLA-Tencor Corp. (Israel) (Israel)
Mike Adel, KLA-Tencor Corp. (Israel) (Israel)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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