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Proceedings Paper

Verification and application of multi-source focus quantification
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Paper Abstract

The concept of the multi-source focus correlation method was presented in 2015 [1, 2]. A more accurate understanding of real on-product focus can be obtained by gathering information from different sectors: design, scanner short loop monitoring, scanner leveling, on-product focus and topography.

This work will show that chip topography can be predicted from reticle density and perimeter density data, including experimental proof. Different pixel sizes are used to perform the correlation in-line with the minimum resolution, correlation length of CMP effects and the spot size of the scanner level sensor. Potential applications of the topography determination will be evaluated, including optimizing scanner leveling by ignoring non-critical parts of the field, and without the need for time-consuming offline topography measurements.

Paper Details

Date Published: 16 March 2016
PDF: 11 pages
Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 97810S (16 March 2016); doi: 10.1117/12.2219143
Show Author Affiliations
J.-G. Simiz, STMicroelectronics (France)
Lab. Hubert Curien, CNRS (France)
T. Hasan, ASML US, Inc. (United States)
F. Staals, ASML Netherlands B.V. (Netherlands)
B. Le-Gratiet, STMicroelectronics (France)
W. T. Tel, ASML Netherlands B.V. (Netherlands)
C. Prentice, ASML SARL (France)
J.-W. Gemmink, ASML Netherlands B.V. (Netherlands)
A. Tishchenko, Lab. Hubert Curien, CNRS (France)
Y. Jourlin, Lab. Hubert Curien, CNRS (France)


Published in SPIE Proceedings Vol. 9781:
Design-Process-Technology Co-optimization for Manufacturability X
Luigi Capodieci, Editor(s)

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