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Proceedings Paper

Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide
Author(s): Seiji Morita; Masahiro Kanno; Ryousuke Yamamoto; Norikatsu Sasao; Shinobu Sugimura
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Paper Abstract

In next generation lithography to make sub-15nm pattern, Directed self-assembly (DSA) and Nano-imprint lithography (NIL) are proposed. The current DSA process is complicated and it is difficult to decrease width and line edge roughness of a guide pattern for sub-15nm patterning. In the case of NIL, it is difficult to make the master template having sub- 15nm pattern. This paper describes cost-effective lithography process for making sub-15nm pattern using DSA on a guide pattern replicated by Nano-imprinting (NIL + DSA). Simple process for making sub-15nm pattern is proposed. The quartz templates are made and line/space patterns of half pitch (hp) 12nm and hp9.5nm are obtained by NIL + DSA.

Paper Details

Date Published: 4 April 2016
PDF: 8 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770K (4 April 2016); doi: 10.1117/12.2219141
Show Author Affiliations
Seiji Morita, Toshiba Corp. (Japan)
Masahiro Kanno, Toshiba Corp. (Japan)
Ryousuke Yamamoto, Toshiba Corp. (Japan)
Norikatsu Sasao, Toshiba Corp. (Japan)
Shinobu Sugimura, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

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