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Proceedings Paper

Metrology target design simulations for accurate and robust scatterometry overlay measurements
Author(s): Guy Ben-Dov; Inna Tarshish-Shapir; David Gready; Mark Ghinovker; Mike Adel; Eitan Herzel; Soonho Oh; DongSub Choi; Sang Hyun Han; Mohamed El Kodadi; Chan Hwang; Jeongjin Lee; Seung Yoon Lee; Kuntack Lee
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Paper Abstract

Overlay metrology target design is an essential step prior to performing overlay measurements. This step is done through the optimization of target parameters for a given process stack. A simulation tool is therefore used to improve measurement performances. This work shows how our Metrology Target Design (MTD) simulator helps significantly in the target design process. We show the role of film and Optical CD measurements in improving significantly the fidelity of the simulations. We demonstrate that for various target design parameters we are capable of predicting measured performance metrics by simulations and correctly rank various designs performances.

Paper Details

Date Published: 8 March 2016
PDF: 12 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97783B (8 March 2016); doi: 10.1117/12.2219108
Show Author Affiliations
Guy Ben-Dov, KLA-Tencor Corp. (Israel) (Israel)
Inna Tarshish-Shapir, KLA-Tencor Corp. (Israel) (Israel)
David Gready, KLA-Tencor Corp. (Israel) (Israel)
Mark Ghinovker, KLA-Tencor Corp. (Israel) (Israel)
Mike Adel, KLA-Tencor Corp. (Israel) (Israel)
Eitan Herzel, KLA-Tencor Corp. (Israel) (Israel)
Soonho Oh, KLA-Tencor Corp. (Korea) (Korea, Republic of)
DongSub Choi, KLA-Tencor Corp. (Korea) (Korea, Republic of)
Sang Hyun Han, KLA-Tencor Corp. (Korea) (Korea, Republic of)
Mohamed El Kodadi, KLA-Tencor Corp. (France) (France)
Chan Hwang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Jeongjin Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seung Yoon Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)
Kuntack Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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