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Proceedings Paper

Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry
Author(s): Jinlong Zhu; Yating Shi; Shiyuan Liu; Lynford L. Goddard
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Paper Abstract

Optical scatterometry is a model based technique, which conventionally requires minimization of a predefined least square function. This minimization relies heavily on the measurement configuration: wavelength, incident angle, azimuthal angle, and sample position, which brings up the question of how to find the configuration that maximizes measurement accuracy. We propose a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy can be approximated as a function of a Jacobian matrix with respect to the measurement configurations. Simulation and experiments for a one-dimensional trapezoidal grating establishes the feasibility of the proposed method.

Paper Details

Date Published: 8 March 2016
PDF: 9 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977823 (8 March 2016); doi: 10.1117/12.2218988
Show Author Affiliations
Jinlong Zhu, Univ. of Illinois at Urbana-Champaign (United States)
Huazhong Univ. of Science and Technology (China)
Yating Shi, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)
Lynford L. Goddard, Univ. of Illinois at Urbana-Champaign (United States)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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