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Proceedings Paper

Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners
Author(s): Thiago S. Jota; Russell A. Chipman
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Paper Abstract

The functional form of coating-induced polarization aberrations in EUV lithography systems is evaluated through polarization ray tracing of an example 3×EUV scanner with state-of-the-art graded multilayer coatings. In particular, the impact of coating-induced on-axis astigmatism, as well as diattenuation and retardance on image quality are investigated. The point spread function (PSF) consists of four polarization-dependent components: two are nearly diffraction limited and two are highly apodized, and all components can be described by a Mueller matrix Point Spread Matrix (PSM). The highly apodized components are “ghost” images that are larger than the diffraction limit, reducing image contrast and resolution.

Paper Details

Date Published: 18 March 2016
PDF: 14 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977617 (18 March 2016); doi: 10.1117/12.2218918
Show Author Affiliations
Thiago S. Jota, College of Optical Sciences, The Univ. of Arizona (United States)
Russell A. Chipman, College of Optical Sciences, The Univ. of Arizona (United States)

Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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