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Proceedings Paper

Positive tone oxide nanoparticle EUV (ONE) photoresists
Author(s): Mufei Yu; Emmanuel P. Giannelis; Christopher K. Ober
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Paper Abstract

Nanoparticles with a variety of organic/inorganic combinations have been investigated and the negative tone patterning was demonstrated using EUV radiation. Zirconium methacrylate (ZrMAA) nanoparticles had sensitivity with EUV exposure as high as 4.2 mJ/cm2 with a resolution up to 22 nm, and an LER of 5.6 nm. Meanwhile, the dual-tone behavior of ZrMAA photoresists using e-beam and deep UV exposures is another attractive feature of the nanoparticle photoresists, which may be further applied with EUV lithography. The current study investigates the positive tone patterning of ZrMAA and the process-dependent image reversal. Our proposed patterning mechanism is further illustrated and optimized based in a positive tone behavior study.

Paper Details

Date Published: 21 March 2016
PDF: 5 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977905 (21 March 2016); doi: 10.1117/12.2218900
Show Author Affiliations
Mufei Yu, Cornell Univ. (United States)
Emmanuel P. Giannelis, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

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