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Proceedings Paper

High-order aberration control during exposure for leading-edge lithography projection optics
Author(s): Yasuhiro Ohmura; Yosuke Tsuge; Toru Hirayama; Hironori Ikezawa; Daisuke Inoue; Yasuhiro Kitamura; Yukio Koizumi; Keisuke Hasegawa; Satoshi Ishiyama; Toshiharu Nakashima; Takahisa Kikuchi; Minoru Onda; Yohei Takase; Akimasa Nagahiro; Susumu Isago; Hidetaka Kawahara
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Paper Abstract

High throughput with high resolution imaging has been key to the development of leading-edge microlithography. However, management of thermal aberrations due to lens heating during exposure has become critical for simultaneous achievement of high throughput and high resolution. Thermal aberrations cause CD drift and overlay error, and these errors lead directly to edge placement errors (EPE). Management and control of high order thermal aberrations is a critical requirement. In this paper, we will show practical performance of the lens heating with dipole and other typical illumination conditions for finer patterning. We confirm that our new control system can reduce the high-order aberrations and enable critical-dimension uniformity CDU during the exposure.

Paper Details

Date Published: 15 March 2016
PDF: 8 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97800Y (15 March 2016); doi: 10.1117/12.2218840
Show Author Affiliations
Yasuhiro Ohmura, Nikon Corp. (Japan)
Yosuke Tsuge, Nikon Corp. (Japan)
Toru Hirayama, Nikon Corp. (Japan)
Hironori Ikezawa, Nikon Corp. (Japan)
Daisuke Inoue, Nikon Corp. (Japan)
Yasuhiro Kitamura, Nikon Corp. (Japan)
Yukio Koizumi, Nikon Corp. (Japan)
Keisuke Hasegawa, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Takahisa Kikuchi, Nikon Corp. (Japan)
Minoru Onda, Nikon Corp. (Japan)
Yohei Takase, Nikon Corp. (Japan)
Akimasa Nagahiro, Nikon Corp. (Japan)
Susumu Isago, Nikon Corp. (Japan)
Hidetaka Kawahara, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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