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Proceedings Paper

An integrated design-to-manufacturing flow for SADP
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Paper Abstract

Self-Aligned-Double-Patterning (SADP) is a potential technology for metal layers in N10 and beyond nodes. SADP manufacturing process comes with lots of challenges. Several approaches were introduced to manufacture SADP. The most major SADP manufacturing approach is the Spacer-Is-Dielectric (SID). One of the main advantages of SADP over Litho-Etch-Litho-Etch (LELE) Double Patterning (DP) is better Mask Overlay Control. In addition, SADP results in better process tolerance and lower Line-Width Roughness. In this paper, we propose a model-based manufacturing flow for SID-SADP approach. The flow includes: (1) SADP Patterns Decomposition, (2) Etch Retargeting, (3) Sub Resolution Assist Features (SRAF) Insertion, (4) Optical Proximity Correction (OPC) process, and finally (5) Verification. The motivation beyond developing this flow is to find the least number of needed masks to achieve satisfactory imaging quality, and to characterize possible challenges in each step of the flow. Consequently, we highlight the challenges and the proposed techniques we examined to meet this objective.

Paper Details

Date Published: 16 March 2016
PDF: 11 pages
Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 97810Y (16 March 2016); doi: 10.1117/12.2218828
Show Author Affiliations
Ahmed Hamed Fatehy, Mentor Graphics Egypt (Egypt)
Rehab Kotb, Mentor Graphics Egypt (Egypt)
James Word, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 9781:
Design-Process-Technology Co-optimization for Manufacturability X
Luigi Capodieci, Editor(s)

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