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Proceedings Paper

Optics-free lithography on colloidal nanocrystal assemblies
Author(s): Santosh Shaw; Kyle J. Miller; Julien L. Colaux; Ludovico Cademartiri
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Paper Abstract

We describe a lithographic approach – Nanocrystal Plasma Polymerization (NPP)-based lithography (Figure 1) – where colloidal nanocrystal assemblies (CNAs) are used as the resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs are redispersed leaving behind the patterned area.

Paper Details

Date Published: 21 March 2016
PDF: 7 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97791J (21 March 2016); doi: 10.1117/12.2218792
Show Author Affiliations
Santosh Shaw, Iowa State Univ. of Science and Technology (United States)
Kyle J. Miller, Iowa State Univ. of Science and Technology (United States)
Julien L. Colaux, Univ. of Surrey (United Kingdom)
Ludovico Cademartiri, Iowa State Univ. of Science and Technology (United States)
Ames Lab. (United States)


Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

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