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Proceedings Paper

Topcoat free orientation control strategies for high-χ block copolymers
Author(s): Ankit Vora; Anindarupa Chunder; Gabriela Alva; Noel Arellano; Kristin Schmidt; Teddie Magbitang; Melia Tjio; Hoa Troung; Elizabeth M. Lofano; Hsinyu Tsai; Hiroyuki Miyazoe; Chi-Chun Liu; Joy Cheng; Daniel P. Sanders
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Paper Details

Date Published:
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Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770V; doi: 10.1117/12.2218635
Show Author Affiliations
Ankit Vora, IBM Research - Almaden (United States)
Anindarupa Chunder, IBM Research - Almaden (United States)
Gabriela Alva, IBM Research - Almaden (United States)
Noel Arellano, IBM Research - Almaden (United States)
Kristin Schmidt, IBM Research - Almaden (United States)
Teddie Magbitang, IBM Research - Almaden (United States)
Melia Tjio, IBM Research - Almaden (United States)
Hoa Troung, IBM Research - Almaden (United States)
Elizabeth M. Lofano, IBM Research - Almaden (United States)
Hsinyu Tsai, IBM Thomas J. Watson Research Ctr. (United States)
Hiroyuki Miyazoe, IBM Thomas J. Watson Research Ctr. (United States)
Chi-Chun Liu, Albany NanoTech (United States)
Joy Cheng, IBM Research - Almaden (United States)
Daniel P. Sanders, IBM Research - Almaden (United States)


Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

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