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Proceedings Paper

Design space exploration for early identification of yield limiting patterns
Author(s): Helen Li; Elain Zou; Robben Lee; Sid Hong; Square Liu; JinYan Wang; Chunshan Du; Recco Zhang; Kareem Madkour; Hussein Ali; Danny Hsu; Aliaa Kabeel; Wael ElManhawy; Joe Kwan
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Paper Abstract

In order to resolve the causality dilemma of which comes first, accurate design rules or real designs, this paper presents a flow for exploration of the layout design space to early identify problematic patterns that will negatively affect the yield.

A new random layout generating method called Layout Schema Generator (LSG) is reported in this paper, this method generates realistic design-like layouts without any design rule violation. Lithography simulation is then used on the generated layout to discover the potentially problematic patterns (hotspots). These hotspot patterns are further explored by randomly inducing feature and context variations to these identified hotspots through a flow called Hotspot variation Flow (HSV). Simulation is then performed on these expanded set of layout clips to further identify more problematic patterns.

These patterns are then classified into design forbidden patterns that should be included in the design rule checker and legal patterns that need better handling in the RET recipes and processes.

Paper Details

Date Published: 16 March 2016
PDF: 8 pages
Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 97810W (16 March 2016); doi: 10.1117/12.2218540
Show Author Affiliations
Helen Li, Semiconductor Manufacturing International Corp. (China)
Elain Zou, Semiconductor Manufacturing International Corp. (China)
Robben Lee, Semiconductor Manufacturing International Corp. (China)
Sid Hong, Semiconductor Manufacturing International Corp. (China)
Square Liu, Semiconductor Manufacturing International Corp. (China)
JinYan Wang, Semiconductor Manufacturing International Corp. (China)
Chunshan Du, Mentor Graphics Shanghai Electronic Technology Co. (China)
Recco Zhang, Mentor Graphics Shanghai Electronic Technology Co. (China)
Kareem Madkour, Mentor Graphics Egypt (Egypt)
Hussein Ali, Mentor Graphics Egypt (Egypt)
Danny Hsu, Mentor Graphics Taiwan, Ltd. (Taiwan)
Aliaa Kabeel, Mentor Graphics Egypt (Egypt)
Wael ElManhawy, Mentor Graphics Corp. (United States)
Joe Kwan, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 9781:
Design-Process-Technology Co-optimization for Manufacturability X
Luigi Capodieci, Editor(s)

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