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Proceedings Paper

Performance of new high-power HVM LPP-EUV source
Author(s): Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Krzysztof M. Nowak; Yasufumi Kawasuji; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Tatsuya Yanagida; Tsuyoshi Yamada; Taku Yamazaki; Shinji Okazaki; Takashi Saitou
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Paper Abstract

We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL since 2003. Unique original technologies such as; combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulse shooting and mitigation with magnetic field have been developed in Gigaphoton Inc.. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. We demonstrated 108W EUV power (I/F clean in burst), 80 kHz, 24 hours stable operation at Proto#2 device. Based on these experimental data we are now constructing first practical source for HVM; “GL200E-Pilot#1”. Target of this device is 250 W EUV power by 27 kW pulsed CO2 driver laser system.

Paper Details

Date Published: 18 March 2016
PDF: 8 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760J (18 March 2016); doi: 10.1117/12.2218405
Show Author Affiliations
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Krzysztof M. Nowak, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Tatsuya Yanagida, Gigaphoton Inc. (Japan)
Tsuyoshi Yamada, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Shinji Okazaki, Gigaphoton Inc. (Japan)
Takashi Saitou, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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