Share Email Print
cover

Proceedings Paper

A novel method to quantify the complex mask patterns
Author(s): Yu-Lung Tung; Che-Yuan Sun; Shu-Chuan Chuang; Woei-Bin Luo; Jia-Rui Hu; Hsiang-Lin Chen; Hua-Tai Lin; Chih-Ming Ke; Tsai-Sheng Gau
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Immersion technology has successfully extends the application of ArF lithography in the semiconductor. However, as we further push the k1 factor below 0.3, the patterning fidelities degrade significantly. In this paper, a novel method to quantify the mask fidelity of complex 2D patterns is proposed. With this method, the critical dimension (CD) error of both edge placement error (EPE) and corner rounding can be well described by using 2 indices "bias" and "blur" respectively. The "bias" is defined as the CD offset between the mask and the targets, and the "blur" is a derived term that can well represent the mask rounding. These 2 indices are not only able to describe the mask quality but also able to link with model parameters that are used in optical proximity correction (OPC) and some other applications. In this paper, we demonstrate the methodology and quantify the actual mask quality on the complex and critical 2D patterning in the advanced nodes.

Paper Details

Date Published: 8 March 2016
PDF: 6 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97783S (8 March 2016); doi: 10.1117/12.2218346
Show Author Affiliations
Yu-Lung Tung, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Che-Yuan Sun, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Shu-Chuan Chuang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Woei-Bin Luo, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Jia-Rui Hu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Hsiang-Lin Chen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Hua-Tai Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Chih-Ming Ke, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Tsai-Sheng Gau, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

© SPIE. Terms of Use
Back to Top