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Proceedings Paper

Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process
Author(s): Akihisa Yoshida; Kenji Yoshimoto; Masahiro Ohshima; Katsuyoshi Kodera; Yoshihiro Naka; Hideki Kanai; Sachiko Kobayashi; Simon Maeda; Phubes Jiravanichsakul; Katsutoshi Kobayashi; Hisako Aoyama
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Paper Abstract

In this study, we investigated a directed self-assembly (DSA) flow that could include a non-periodic pattern (i.e., wide line) lying in between the periodic line/space patterns, in a relatively simple and inexpensive way. A symmetric poly(styrene-block-methyl methacrylate) (PS-b-PMMA) with the natural periodicity (L0) of 30 nm was employed here. Our DSA flow has two key features. First, we used a hybrid approach that combined chemoepitaxy and graphoepitaxy methods to generate PMMA-attractive pinning guide patterns directly from ArF resist. Second, we attempted to utilize both the perpendicular lamellae in the periodic regions and the horizontal lamellae on the non-periodic pattern as an etch template. The advantage of this process will be a reduction of the number of lithographic processes, whereas the challenge is how to control the mixed morphologies at the boundary between the periodic and non-periodic regions. Our preliminary results from simulations and experiments showed that, in order to generate the horizontal lamellae on the non-periodic pattern, the PS-b-PMMA thickness on top of the non-periodic guide pattern should roughly match to ~1 L0, and the width of the non-periodic pattern should be larger than ~3-4 L0. In addition, the space between the periodic and non-periodic regions was found to be critical and it should be basically equal to the space between the guiding pins in the periodic regions (~75 nm) to minimize the formation of fingerprint morphology at the boundaries.

Paper Details

Date Published: 1 April 2016
PDF: 7 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771O (1 April 2016); doi: 10.1117/12.2218234
Show Author Affiliations
Akihisa Yoshida, Kyoto Univ. (Japan)
Kenji Yoshimoto, Kyoto Univ. (Japan)
Masahiro Ohshima, Kyoto Univ. (Japan)
Katsuyoshi Kodera, Toshiba Corp. (Japan)
Yoshihiro Naka, Toshiba Corp. (Japan)
Hideki Kanai, Toshiba Corp. (Japan)
Sachiko Kobayashi, Toshiba Corp. (Japan)
Simon Maeda, Toshiba Corp. (Japan)
Phubes Jiravanichsakul, Toshiba Corp. (Japan)
Katsutoshi Kobayashi, Toshiba Corp. (Japan)
Hisako Aoyama, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

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