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Proceedings Paper

Study of nanometer-thick graphite film for high-power EUVL pellicle
Author(s): Mun Ja Kim; Hwan Chul Jeon; Roman Chalykh; Eokbong Kim; Jihoon Na; Byung-Gook Kim; Heebom Kim; Chanuk Jeon; Seul-Gi Kim; Dong-Wook Shin; Taesung Kim; Sooyoung Kim; Jung Hun Lee; Ji-Beom Yoo
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Paper Abstract

Extreme ultraviolet (EUV) lithography has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10nm. Recently EUV pellicle introduction is required to improve particle level inside scanner for EUV mass production. We demonstrate that a new pellicle material, nanometer-thick graphite film (NGF), is one of the best candidates of EUV pellicle membrane. A NGF pellicle with excellent thermal (ε≥0.4 @R.T, <100nm), mechanical (415MPa @~100nm), chemical and optical (24hrs durability under exposure of EUV/H2 at 4W/cm2 with pH2~5Pa) properties can be a promising and superb candidate for EUV pellicle membrane compared to Si pellicles with capping layers.

Paper Details

Date Published: 18 March 2016
PDF: 10 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761Z (18 March 2016); doi: 10.1117/12.2218228
Show Author Affiliations
Mun Ja Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hwan Chul Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Roman Chalykh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Eokbong Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jihoon Na, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung-Gook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Heebom Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chanuk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seul-Gi Kim, Sungkyunkwan Univ. (Korea, Republic of)
Dong-Wook Shin, Sungkyunkwan Univ. (Korea, Republic of)
Taesung Kim, Sungkyunkwan Univ. (Korea, Republic of)
Sooyoung Kim, Sungkyunkwan Univ. (Korea, Republic of)
Jung Hun Lee, Sungkyunkwan Univ. (Korea, Republic of)
Ji-Beom Yoo, Sungkyunkwan Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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