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Proceedings Paper

Scanner baseliner monitoring and control in high volume manufacturing
Author(s): Pavan Samudrala; Woong Jae Chung; Nyan Aung; Lokesh Subramany; Haiyong Gao; Juan-Manuel Gomez
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Paper Abstract

We analyze performance of different customized models on baseliner overlay data and demonstrate the reduction in overlay residuals by ~10%. Smart Sampling sets were assessed and compared with the full wafer measurements. We found that performance of the grid can still be maintained by going to one-third of total sampling points, while reducing metrology time by 60%. We also demonstrate the feasibility of achieving time to time matching using scanner fleet manager and thus identify the tool drifts even when the tool monitoring controls are within spec limits. We also explore the scanner feedback constant variation with illumination sources.

Paper Details

Date Published: 8 March 2016
PDF: 6 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977838 (8 March 2016); doi: 10.1117/12.2218162
Show Author Affiliations
Pavan Samudrala, GLOBALFOUNDRIES (United States)
Woong Jae Chung, GLOBALFOUNDRIES (United States)
Nyan Aung, GLOBALFOUNDRIES (United States)
Lokesh Subramany, GLOBALFOUNDRIES (United States)
Haiyong Gao, GLOBALFOUNDRIES (United States)
Juan-Manuel Gomez, GLOBALFOUNDRIES (United States)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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