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Proceedings Paper

Overlay optimization for 1x node technology and beyond via rule based sparse sampling
Author(s): Nyan Lynn Aung; Woong Jae Chung; Lokesh Subramany; Shehzeen Hussain; Pavan Samudrala; Haiyong Gao; Xueli Hao; Yen-Jen Chen; Juan-Manuel Gomez
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Paper Abstract

We demonstrate a cost-effective automated rule based sparse sampling method that can detect the spatial variation of overlay errors as well as the overlay signature of the fields. Our technique satisfies the following three rules: (i) homogeneous distribution of ~200 samples across the wafer, (ii) equal number of samples in scan up and scan down condition and (iii) equal number of sampling on each overlay marks per field. When rule based samplings are implemented on the two products, the differences between the full wafer map sampling and the rule based sampling are within 3.5 nm overlay spec with residuals M+3σ of 2.4 nm (x) and 2.43 nm (y) for Product A and 2.98 nm (x) and 3.32 nm (y) for Product B.

Paper Details

Date Published: 8 March 2016
PDF: 7 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97782G (8 March 2016); doi: 10.1117/12.2218161
Show Author Affiliations
Nyan Lynn Aung, GLOBALFOUNDRIES (United States)
Woong Jae Chung, GLOBALFOUNDRIES (United States)
Lokesh Subramany, GLOBALFOUNDRIES (United States)
Shehzeen Hussain, GLOBALFOUNDRIES (United States)
Pavan Samudrala, GLOBALFOUNDRIES (United States)
Haiyong Gao, GLOBALFOUNDRIES (United States)
Xueli Hao, GLOBALFOUNDRIES (United States)
Yen-Jen Chen, GLOBALFOUNDRIES (United States)
Juan-Manuel Gomez, GLOBALFOUNDRIES (United States)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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