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Proceedings Paper

Experiments towards establishing of design rules for R2R-UV-NIL with polymer working shims
Author(s): Dieter Nees; Stephan Ruttloff; Ursula Palfinger; Barbara Stadlober
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Paper Abstract

Roll-to-Roll-UV-nanoimprint lithography (R2R-UV-NIL) enables high resolution large area patterning of flexible substrates and is therefore of increasing industrial interest. We have set up a custom-made R2R-UV-NIL pilot machine which is able to convert 10 inch wide web with velocities of up to 30 m/min. In addition, we have developed self-replicable UV-curable resins with tunable surface energy and Young’s modulus for UV-imprint material as well as for polymer working stamp/shim manufacturing. Now we have designed test patterns for the evaluation of the impact of structure shape, critical dimension, pitch, depth, side wall angle and orientation relative to the web movement onto the imprint fidelity and working shim life time. We have used female (recessed structures) silicon masters of that design with critical dimensions between CD = 200 nm and 1600 nm, and structure depths of d = 500 nm and 1000 nm - all with vertical as well as inclined side walls. These entire master patterns have been transferred onto single male (protruding structures) R2R polymer working shims. The polymer working shims have been used for R2R-UV-NIL runs of several hundred meters and the imprint fidelity and process stability of the various test patterns have been compared. This study is intended as a first step towards establishing of design rules and developing of nanoimprint proximity correction strategies for industrial R2R-UV-NIL processes using polymer working shims.

Paper Details

Date Published: 22 March 2016
PDF: 18 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770D (22 March 2016); doi: 10.1117/12.2218134
Show Author Affiliations
Dieter Nees, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Stephan Ruttloff, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Ursula Palfinger, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Barbara Stadlober, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)


Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

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