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Proceedings Paper

Multilayers for EUV, soft x-ray and x-ray optics
Author(s): Zhanshan Wang; Qiushi Huang; Zhong Zhang; Tianxin Yang
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Paper Abstract

Driven by the requirements in synchrotron radiation applications, astronomical observation, and dense plasma diagnostics, the EUV, soft X-rays and X-rays multilayer optics have been tremendously developed. Based on the LAMP project for soft X-ray polarimetry, Co/C and Cr/C multilayers have been fabricated and characterized. Both Co/C and Cr/C multilayers reveal good optical performance working at 250 eV. Pd/Y multilayers have been successfully fabricated using reactive sputtering with nitrogen working at around 9.4 nm. EUV normal incidence Schwarzschild and soft X-ray grazing incidence KB microscopes were developed for ICF plasma diagnostics. This paper covers the outline of the multilayer optics and the current status in our lab.

Paper Details

Date Published: 2 May 2016
PDF: 12 pages
Proc. SPIE 9747, Terahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications IX, 97471K (2 May 2016); doi: 10.1117/12.2218081
Show Author Affiliations
Zhanshan Wang, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Tianxin Yang, Tianjin Univ. (China)


Published in SPIE Proceedings Vol. 9747:
Terahertz, RF, Millimeter, and Submillimeter-Wave Technology and Applications IX
Laurence P. Sadwick; Tianxin Yang, Editor(s)

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