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Proceedings Paper

100W EUV light-source key component technology update for HVM
Author(s): Tsukasa Hori; Yasufumi Kawasuji; Hiroshi Tanaka; Yukio Watanabe; Yutaka Shiraishi; Tamotsu Abe; Takeshi Okamoto; Takeshi Kodama; Hiroaki Nakarai; Taku Yamazaki; Shinji Okazaki; Takashi Saitou; Hakaru Mizoguchi
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Paper Abstract

Gigaphoton Inc. develops a high-power laser produced plasma extreme ultraviolet (LPP EUV) light source for high volume manufacturing which enables sub-10nm critical layer patterning for semiconductor device fabrication. A technology update of key components of a 100 W LPP-EUV light source is given in this paper. The key components efficiently produce a stable plasma and evacuate the tin debris from the EUV vessel with a magnetic debris mitigation system. The chosen technology guarantees therefore a high-power and long-life EUV light source system. Each component is described with updated data. The latest system performance results are also presented. They were obtained from our proto LPP-EUV light systems which support 100 W output power.

Paper Details

Date Published: 18 March 2016
PDF: 9 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977625 (18 March 2016); doi: 10.1117/12.2217947
Show Author Affiliations
Tsukasa Hori, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Takeshi Okamoto, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Shinji Okazaki, Gigaphoton Inc. (Japan)
Takashi Saitou, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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