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Proceedings Paper

Microfocusing 4-keV to 65-keV xrays with bent Kirkpatrick-Baez mirrors
Author(s): Peter J. Eng; Mark L. Rivers; Bingxin X. Yang; Wilfried Schildkamp
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Paper Abstract

We present the test results of micro-focusing a continuous spectrum (4 KeV - 65 keV) of x rays using two, 100 mm long, actively bent mirrors in a Kirkpatrick-Baez geometry. The mirrors are figured by applying in situ two different moments on the ends resulting in a surface figure that approximates an ellipse. We have demonstrated the ability to doubly focus NSLS bending magnet x rays from 4 KeV to 13 KeV to a spot size less than 4 microns in diameter with a net gain of 2000 over a similar size beam produced with slits. In the bending magnet test the beam was focused in the vertical direction with a high quality rhodium coated Si mirror with a rms surface roughness and slope error less than 2 angstrom and 2 (mu) rad, respectively. The horizontal mirror consisted of uncoated float glass with significantly greater roughness and slope error. This combination of mirrors worked extremely well, pointing the direction for inexpensive micro-focusing optics. Vertical focusing tests were also performed using only the high quality Si mirror. On the bending magnet, x rays were focused to 30 KeV using an incidence angle of 2 mrad achieving a best focus of 2.5 microns FWHM, resulting in a net gain of 91. Additional high energy focusing tests were carried out at the NSLS superconducting wiggler beamline X17. In this case a continuous x-ray spectrum was vertically focused using the Si mirror with an energy cutoff of 65 KeV (at an incident angle of 1 mrad) achieving a focal spot size of 3.3 microns FWHM and a net gain of 20.

Paper Details

Date Published: 25 September 1995
PDF: 11 pages
Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); doi: 10.1117/12.221682
Show Author Affiliations
Peter J. Eng, Univ. of Chicago (United States)
Mark L. Rivers, Univ. of Chicago (United States)
Bingxin X. Yang, Univ. of Chicago (United States)
Wilfried Schildkamp, Univ. of Chicago (United States)


Published in SPIE Proceedings Vol. 2516:
X-Ray Microbeam Technology and Applications
Wenbing Yun, Editor(s)

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