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Proceedings Paper

Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)
Author(s): Cheng-Hao Ko; Janos Kirz; Klaus Maier; Barry L. Winn; Harald Ade; Steven L. Hulbert; Erik D. Johnson; Erik H. Anderson
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Paper Abstract

The second generation scanning photoelectron microscope at beamline X1A of the National Synchrotron Light Source (X1A SPEM-II) is designed for spatially resolved elemental and chemical analysis by x ray photoelectron spectroscopy (XPS) on material surfaces. This microscope can focus photon energies between 300 to 800 eV with submicron spatial resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer (HSA) with multi-channel detection (MCD), which enables a technique called 'parallel imaging for chemical state mapping' (PICSM). The PICSM technique was demonstrated using a Si/SiO2 pattern.

Paper Details

Date Published: 25 September 1995
PDF: 10 pages
Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); doi: 10.1117/12.221668
Show Author Affiliations
Cheng-Hao Ko, SUNY/Stony Brook (United States)
Janos Kirz, SUNY/Stony Brook (United States)
Klaus Maier, SUNY/Stony Brook (United States)
Barry L. Winn, SUNY/Stony Brook (United States)
Harald Ade, North Carolina State Univ. (United States)
Steven L. Hulbert, Brookhaven National Lab. (United States)
Erik D. Johnson, Brookhaven National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 2516:
X-Ray Microbeam Technology and Applications
Wenbing Yun, Editor(s)

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