Share Email Print
cover

Proceedings Paper

Optical-field-induced ionization x-ray laser studies using a preformed plasma
Author(s): Katsumi Midorikawa; Yutaka Nagata; Minoru Obara; Koichi Toyoda
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Soft x-ray amplification by optical-field-induced ionization (OFI) of a preformed plasma is investigated. Experimental and numerical results ensure that we have produced a plasma with a significantly lower electron temperature than what is expected by an above-threshold ionization model. In order to explain the results, a two-component plasma model in which relatively high temperature electrons are produced by OFI in a cold electron bath of the preformed plasma is presented. The model indicates that the average electron temperature of the OFI plasma rapidly decreases since a high-temperature part of the electrons escapes from the focal volume without interaction. The initial electrons produced prior to the field ionization which survive after the OFI also significantly contribute to the rapid three-body recombination. Based on the ionization-induced refractive-index change, the pulse propagation of a high-intensity pump laser during the OFI is also discussed.

Paper Details

Date Published: 25 September 1995
PDF: 7 pages
Proc. SPIE 2520, Soft X-Ray Lasers and Applications, (25 September 1995); doi: 10.1117/12.221662
Show Author Affiliations
Katsumi Midorikawa, RIKEN--The Institute of Physical and Chemical Research (Japan)
Yutaka Nagata, Keio Univ. (Japan)
Minoru Obara, Keio Univ. (Japan)
Koichi Toyoda, RIKEN--The Institute of Physical and Chemical Research (Japan)


Published in SPIE Proceedings Vol. 2520:
Soft X-Ray Lasers and Applications
Jorge J. G. Rocca; Peter L. Hagelstein, Editor(s)

© SPIE. Terms of Use
Back to Top