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Proceedings Paper

Micromachined electron gun array (MEGA)
Author(s): Noel C. MacDonald; Wolfgang Hofmann; Liang-Yuh Chen; John H. Das
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Paper Abstract

We present the Micro-machined Electron Gun Array (MEGA) as a massively-parallel approach to high throughput production electron beam lithography. The fabrication of the various components of the MEGA are described and the electron optical properties of micro- machined electron guns (MEGs) are studied using electron-optical simulation software. Electron-electron interaction between multiple beams is studied through Monte Carlo simulations for a number of configurations.

Paper Details

Date Published: 25 September 1995
PDF: 10 pages
Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); doi: 10.1117/12.221612
Show Author Affiliations
Noel C. MacDonald, Cornell Univ. (United States)
Wolfgang Hofmann, Cornell Univ. (United States)
Liang-Yuh Chen, Cornell Univ. (United States)
John H. Das, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 2522:
Electron-Beam Sources and Charged-Particle Optics
Eric Munro; Henry P. Freund, Editor(s)

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