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Proceedings Paper

Electron-optical design for the SCALPEL proof-of-concept tool
Author(s): Warren K. Waskiewicz; Steven D. Berger; Lloyd R. Harriott; Masis M. Mkrtchyan; Stephen W. Bowler; J. M. Gibson
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Paper Abstract

A proof-of-concept experimental lithography tool, based upon the SCALPELTM principle, is currently being fabricated at AT&T Bell Laboratories. Designed from a lithographic system perspective, we feel that this experimental platform is the minimal configuration necessary to evaluate this specific printing technique, consistent with design rules from 0.18 micrometers to 0.09 micrometers . Details of the machine's electron-optics are presented, including the calculated performance of the electromagnetic lens systems. The critical lithography issues which will be examined using this tool are also discussed.

Paper Details

Date Published: 25 September 1995
PDF: 10 pages
Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); doi: 10.1117/12.221577
Show Author Affiliations
Warren K. Waskiewicz, AT&T Bell Labs. (United States)
Steven D. Berger, AT&T Bell Labs. (United States)
Lloyd R. Harriott, AT&T Bell Labs. (United States)
Masis M. Mkrtchyan, AT&T Bell Labs. (United States)
Stephen W. Bowler, AT&T Bell Labs. (United States)
J. M. Gibson, Univ. of Illinois/Urbana-Champaign (United States)


Published in SPIE Proceedings Vol. 2522:
Electron-Beam Sources and Charged-Particle Optics
Eric Munro; Henry P. Freund, Editor(s)

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