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Proceedings Paper

Electron-beam microcolumn technology and applications
Author(s): T.H. Philip Chang; Michael G.R. Thomson; M. L. Yu; Ernst Kratschmer; H. S. Kim; Kim Y. Lee; Stephen A. Rishton; Dieter P. Kern
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Paper Abstract

A fully functional electron beam microcolumn, 3.5 mm in length, demonstrating a probe size of 10 nm and beam current >= 1 nA at 1 keV has been successfully developed. This paper presents its current status and future directions. Potential applications ranging from low cost scanning electron microscopy to arrays of such microcolumns for lithography, metrology, testing etc. will be discussed.

Paper Details

Date Published: 25 September 1995
PDF: 9 pages
Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); doi: 10.1117/12.221566
Show Author Affiliations
T.H. Philip Chang, IBM Thomas J. Watson Research Ctr. (United States)
Michael G.R. Thomson, IBM Thomas J. Watson Research Ctr. (United States)
M. L. Yu, IBM Thomas J. Watson Research Ctr. (United States)
Ernst Kratschmer, IBM Thomas J. Watson Research Ctr. (United States)
H. S. Kim, IBM Thomas J. Watson Research Ctr. (United States)
Kim Y. Lee, IBM Thomas J. Watson Research Ctr. (United States)
Stephen A. Rishton, IBM Thomas J. Watson Research Ctr. (United States)
Dieter P. Kern, Tuebingen Univ. (Germany)


Published in SPIE Proceedings Vol. 2522:
Electron-Beam Sources and Charged-Particle Optics
Eric Munro; Henry P. Freund, Editor(s)

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