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Proceedings Paper

Controlling the parameters of wet lateral oxidation for VCSEL fabrication
Author(s): Majid Riaziat; David Reed; Alex Kor
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Paper Abstract

Physical parameters that need to be controlled during the wet oxidation of VCSEL mesas are numerous and include: temperature uniformity, vapor flow pattern, epitaxial thickness and composition uniformity, diffusion through adjacent layers, oxidation onset delay, etch skirt, and wafer surface prep. We report the results of our studies on some of these factors including vapor flow patterns, and oxidation front monitoring. The results are being used for the optimization of our commercial system for wet lateral oxidation.

Paper Details

Date Published: 4 March 2016
PDF: 9 pages
Proc. SPIE 9766, Vertical-Cavity Surface-Emitting Lasers XX, 97660H (4 March 2016); doi: 10.1117/12.2214506
Show Author Affiliations
Majid Riaziat, California Scientific, Inc. (United States)
David Reed, California Scientific, Inc. (United States)
Alex Kor, California Scientific, Inc. (United States)

Published in SPIE Proceedings Vol. 9766:
Vertical-Cavity Surface-Emitting Lasers XX
Kent D. Choquette; James K. Guenter, Editor(s)

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