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Proceedings Paper

Process equipment particle control for yield improvement
Author(s): Kiyoshi Mori; Nam Nguyen; JoAnn Kantapit
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Paper Abstract

Particles from process equipment have serious effects on the yield and profitability of a manufacturing facility. With a more advanced inspection tool, more particles are detected, but it is too costly to try to eliminate them all. It is necessary to identify the sources of the highest yield-killing defects to prioritize the efforts for effective yield improvement. This paper reviews the causes of process equipment particle and discusses the strategies and methodologies to achieve the goal of particle reduction for effective yield improvement.

Paper Details

Date Published: 22 September 1995
PDF: 8 pages
Proc. SPIE 2635, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis, (22 September 1995); doi: 10.1117/12.221433
Show Author Affiliations
Kiyoshi Mori, Sony Semiconductor Co. (United States)
Nam Nguyen, Sony Semiconductor Co. (United States)
JoAnn Kantapit, Sony Semiconductor Co. (United States)


Published in SPIE Proceedings Vol. 2635:
Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
Gopal Rao; Massimo Piccoli, Editor(s)

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