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Proceedings Paper

Development of new maskless manufacturing method for anti-reflection structure and application to large-area lens with curved surface
Author(s): Kazuya Yamamoto; Toshimitsu Takaoka; Hidetoshi Fukui; Yasuyuki Haruta; Tomoya Yamashita; Seiichiro Kitagawa
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Paper Abstract

In general, thin-film coating process is widely applied on optical lens surface as anti-reflection function. In normal production process, at first lens is manufactured by molding, then anti-reflection is added by thin-film coating. In recent years, instead of thin-film coating, sub-wavelength structures adding on surface of molding die are widely studied and development to keep anti-reflection performance. As merits, applying sub-wavelength structure, coating process becomes unnecessary and it is possible to reduce man-hour costs. In addition to cost merit, these are some technical advantages on this study. Adhesion of coating depends on material of plastic, and it is impossible to apply anti-reflection function on arbitrary surface. Sub-wavelength structure can solve both problems. Manufacturing method of anti-reflection structure can be divided into two types mainly. One method is with the resist patterning, and the other is mask-less method that does not require patterning.

What we have developed is new mask-less method which is no need for resist patterning and possible to impart an anti-reflection structure to large area and curved lens surface, and can be expected to apply to various market segments. We report developed technique and characteristics of production lens.

Paper Details

Date Published: 4 March 2016
PDF: 9 pages
Proc. SPIE 9742, Physics and Simulation of Optoelectronic Devices XXIV, 974221 (4 March 2016); doi: 10.1117/12.2213776
Show Author Affiliations
Kazuya Yamamoto, Nalux Co., Ltd. (Japan)
Toshimitsu Takaoka, Nalux Co., Ltd. (Japan)
Hidetoshi Fukui, Nalux Co., Ltd. (Japan)
Yasuyuki Haruta, Nalux Co., Ltd. (Japan)
Tomoya Yamashita, Nalux Co., Ltd. (Japan)
Seiichiro Kitagawa, Nalux Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 9742:
Physics and Simulation of Optoelectronic Devices XXIV
Bernd Witzigmann; Marek Osiński; Yasuhiko Arakawa, Editor(s)

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