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Proceedings Paper

SCA and SPV in line monitoring
Author(s): Kathy Barla; D. Levy; A. Fleury; J. P. Reynard; L. Kwakman
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Paper Abstract

In an industrial environment, new techniques based on the surface photovoltage measurement (SCA and SPV), are shown to detect sodium, aluminum, iron contamination in the range of E + 10/cm2. Variations in the measurements due to wafer samples or oxidation recipe are determined. From these results, a procedure for preparing monitoring samples is established. It is demonstrated that these monitoring tools are useful to monitor equipment but a correlation between the defectivity on a 12 nm gate oxide and SCA and SPV results with the same recipes was not obtained.

Paper Details

Date Published: 19 September 1995
PDF: 10 pages
Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); doi: 10.1117/12.221309
Show Author Affiliations
Kathy Barla, CNET (France)
D. Levy, CNET (France)
A. Fleury, CNET (France)
J. P. Reynard, CNET (France)
L. Kwakman, CNET (France)


Published in SPIE Proceedings Vol. 2637:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing
Anant G. Sabnis; Ivo J. Raaijmakers, Editor(s)

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