Share Email Print
cover

Proceedings Paper

Advances in 193 nm excimer lasers for mass spectrometry applications
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Ongoing progress in mass analysis applications such as laser ablation inductively coupled mass spectrometry of solid samples and ultraviolet photoionization mediated sequencing of peptides and proteins is to a large extent driven by ultrashort wavelength excimer lasers at 193 nm. This paper will introduce the latest improvements achieved in the development of compact high repetition rate excimer lasers and elaborate on the impact on mass spectrometry instrumentation. Various performance and lifetime measurements obtained in a long-term endurance test over the course of 18 months will be shown and discussed in view of the laser source requirements of different mass spectrometry tasks. These sampling type applications are served by excimer lasers delivering pulsed 193 nm output of several mJ as well as fast repetition rates which are already approaching one Kilohertz. In order to open up the pathway from the laboratory to broader market industrial use, sufficient component lifetimes and long-term stable performance behavior have to be ensured. The obtained long-term results which will be presented are based on diverse 193 nm excimer laser tube improvements aiming at e.g. optimizing the gas flow dynamics and have extended the operational life the laser tube for the first time over several billion pulses even under high duty-cycle conditions.

Paper Details

Date Published: 4 March 2016
PDF: 6 pages
Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X, 97361P (4 March 2016); doi: 10.1117/12.2212885
Show Author Affiliations
Ralph Delmdahl, Coherent LaserSystems GmbH & Co. KG (Germany)
Hans-Gerd Esser, Coherent LaserSystems GmbH & Co. KG (Germany)
Guido Bonati, Coherent LaserSystems GmbH & Co. KG (Germany)


Published in SPIE Proceedings Vol. 9736:
Laser-based Micro- and Nanoprocessing X
Udo Klotzbach; Kunihiko Washio; Craig B. Arnold, Editor(s)

© SPIE. Terms of Use
Back to Top