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Proceedings Paper

Photolithography transfer setup for periodic and nonperiodic masks
Author(s): Michel Neviere; Frederic Montiel; Olivier M. Parriaux
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Paper Abstract

Using the modal theory of perfectly conducting and finite conductivity lamellar gratings adapted to stratified media encountered in photolithographic transfer set-ups, we investigate a mounting patented 15 years ago and designed to obtain a faithful reproduction of a masks pierced with periodically distributed slits. We make a systematic study of the influence of the various parameters (incidence, mark-space ratio, groove spacing, groove depth, polarization, conductivity of the metal) on the field map below the mask. We discover a large tolerance over the parameters around the values stated in the patent. The result is that the set-up described in the patent can be used for duplicating non-periodic masks (e. g. linear Fresnel zone plates) as well as chirped gratings or gratings with non rectilinear grooves. Experiments have confirmed that predictions. Keywords: Grating mask transfer; Photolithography.

Paper Details

Date Published: 22 September 1995
PDF: 7 pages
Proc. SPIE 2532, Application and Theory of Periodic Structures, (22 September 1995); doi: 10.1117/12.221218
Show Author Affiliations
Michel Neviere, Lab. d'Optique Electromagnetique/CNRS (France)
Frederic Montiel, Lab. d'Optique Electromagnetique/CNRS (France)
Olivier M. Parriaux, Ctr. Suisse d'Electronique et de Microtechnique SA (Switzerland)

Published in SPIE Proceedings Vol. 2532:
Application and Theory of Periodic Structures
Tomasz Jannson, Editor(s)

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