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Proceedings Paper

Heat transfer analysis of two wavelengths laser microprocessing inside glass
Author(s): Aoi Matsumoto; Takayuki Tamaki; Shinichi Enoki; Keisuke Yahata; Etsuji Ohmura
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Paper Abstract

We investigated the relationship between size of melting marks formed inside glass and irradiation time and absorptivity of femtosecond laser beam. For this investigation the absorptivities for static exposure in fs-laser processing (femtosecond laser microprocessing inside glass) was estimated to approximately 4.5 [%]. Also the size of melting marks formed by fs-laser processing was measured with two irradiation times (1/125 [s] and 1/4 [s]). The sizes were much the same. Thus, in this time scale, the size was nearly independent of the irradiation time. Furthermore, luminescence phenomenon that occurred in fs-laser processing was observed. The duration of this luminescence was less than 2/1000 [s]. With the above experimental results, we demonstrated numerical heat transfer analysis during the fs-laser processing. From the experimental and numerical results it thought that the most process in fs-laser processing finishes within 2/1000 [s].

Paper Details

Date Published: 4 March 2016
PDF: 8 pages
Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X, 97361I (4 March 2016); doi: 10.1117/12.2211287
Show Author Affiliations
Aoi Matsumoto, Nara National College of Technology (Japan)
Takayuki Tamaki, Nara National College of Technology (Japan)
Shinichi Enoki, Nara National College of Technology (Japan)
Keisuke Yahata, Mitsuboshi Diamond Industrial Co., Ltd. (Japan)
Etsuji Ohmura, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 9736:
Laser-based Micro- and Nanoprocessing X
Udo Klotzbach; Kunihiko Washio; Craig B. Arnold, Editor(s)

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