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Proceedings Paper

The next generation of maskless lithography
Author(s): Steffen Diez
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Paper Abstract

The essential goal for fast prototyping of microstructures is to reduce the cycle time. Conventional methods up to now consist of creating designs with a CAD software, then fabricating or purchasing a Photomask and finally using a mask aligner to transfer the pattern to the photoresist. The new Maskless Aligner (MLA) enables to expose the pattern directly without fabricating a mask, which results in a significantly shorter prototyping cycle. To achieve this short prototyping cycle, the MLA has been improved in many aspects compared to other direct write lithography solutions: exposure speed, user interface, ease of operation and flexibility.

Paper Details

Date Published: 15 March 2016
PDF: 11 pages
Proc. SPIE 9761, Emerging Digital Micromirror Device Based Systems and Applications VIII, 976102 (15 March 2016); doi: 10.1117/12.2211052
Show Author Affiliations
Steffen Diez, Heidelberg Instruments Mikrotechnik GmbH (Germany)


Published in SPIE Proceedings Vol. 9761:
Emerging Digital Micromirror Device Based Systems and Applications VIII
Michael R. Douglass; Philip S. King; Benjamin L. Lee, Editor(s)

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