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Proceedings Paper

Characterization of a laser plasma water droplet EUV source
Author(s): Feng Jin; Martin C. Richardson; Gregory M. Shimkaveg; David Scott Torres
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Paper Abstract

We have configured a new type of target for laser plasma x-ray generation. This target consists of an in-vacuum flowing stream of liquid water droplets. We have successfully produced plasmas using this target, and have measured its extreme ultraviolet (EUV) emission spectrum. Bright lines from Li-like and He-like oxygen dominate in the plasma radiation in this region. Most importantly, not target debris related effects were observed for this type of target. A nearby Mo/Si multilayer EUV mirror suffered no reflectivity reduction at 13 nm after exposure to 105 laser shots on target. This observation constitutes a major breakthrough in the utilization of laser plasma radiation for practical applications, in particular, for EUV projection lithography of advanced microelectronic circuits. The simplicity and versatility of a continuously-fed target with naturally smooth surface and no associated debris problems meshes strongly with the critical engineering required for envisioned production line EUV projection lithography installations. Additionally, through the use of water based solutions as targets, it should be possible to tailor the EUV emission spectrum to match the source requirements for other potential applications, such as the x-ray microscopy.

Paper Details

Date Published: 18 September 1995
PDF: 7 pages
Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220999
Show Author Affiliations
Feng Jin, CREOL/Univ. of Central Florida (United States)
Martin C. Richardson, CREOL/Univ. of Central Florida (United States)
Gregory M. Shimkaveg, CREOL/Univ. of Central Florida (United States)
David Scott Torres, CREOL/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 2523:
Applications of Laser Plasma Radiation II
Martin C. Richardson; George A. Kyrala, Editor(s)

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