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Proceedings Paper

Investigation of glass polycapillaries for use in proximity x-ray lithography
Author(s): Ira Klotzko; Qi-Fan Xiao; David M. Gibson; Robert Gregory Downing; Walter M. Gibson; Andrei A. Karnaukhov; Chris J. Jezewski
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Paper Abstract

Achieving the goals set by the US National Semiconductor Roadmap requires that sub 0.18 micrometers design rules be incorporated into semiconductor device structures by the year 2001. A promising approach makes use of shorter wavelength radiation than is presently used in lithography, namely x-rays. Arrays of glass fibers have the potential of controlling parameters important to point-source lithogrpahy including local divergence, global divergence, and field uniformity. The high absorption rate and scattering of x-rays in air at energies less than 3 keV necessitates that experiments must be conducted in an evacuated environment. Consequently, there has been little research on the transmission of x-rays through glass polycapillary fibers at energies of 3 keV and lower. An experimental setup to test capillaries under such conditions has been developed at XOS. It has sufficiently long optical paths in the vacuum chamber to be useful in evaluating the parameters critical for semiconductor lithography. Experimental and simulated transmission characteristics of polycapillary fibers as well as a discussion on the feasibility of using them in a collimator for x-ray lithography are presented in this paper.

Paper Details

Date Published: 18 September 1995
PDF: 9 pages
Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220993
Show Author Affiliations
Ira Klotzko, X-Ray Optical Systems Inc. and SUNY/Albany (United States)
Qi-Fan Xiao, X-Ray Optical Systems Inc. (United States)
David M. Gibson, X-Ray Optical Systems Inc. (United States)
Robert Gregory Downing, X-Ray Optical Systems Inc. (United States)
Walter M. Gibson, SUNY/Albany (United States)
Andrei A. Karnaukhov, X-Ray Optical Systems Inc. (United States)
Chris J. Jezewski, X-Ray Optical Systems Inc. and SUNY/Albany (United States)


Published in SPIE Proceedings Vol. 2523:
Applications of Laser Plasma Radiation II
Martin C. Richardson; George A. Kyrala, Editor(s)

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