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Proceedings Paper

Developments of a high-power, low-contamination laser-plasma source for EUV projection lithography
Author(s): Leonid A. Shmaenok; Fred Bijkerk; C. Bruineman; R. K. F. Bastiaensen; Alexander P. Shevelko; Dmitrii M. Simanovski; A. N. Gladskikh; Sergei V. Bobashev
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Paper Abstract

Results on laser plasma EUV characteristics for various target materials and irradiation conditions are presented. Spectra of high-Z elements in the 12.5-15.4 nm range from plasmas generated with a high-power KrF laser at 2 X 1012 W/cm2 were measured. The highest conversion efficiency (CE) of 0.85% in 2% BW was found for Re near 13.6 nm, corresponding to a maximal EUV power of 550 mW in 2% BW at 50 Hz. The use of two successive laser pulses, investigated with 2.5 ns pulses of 0.53 micrometers radiation at (0.5-1) X 1013, resulted in an increase of the CE by a factor of 1.8-2.3 for the second pulse at specific delay values (6 and 12 ns for W). The total CE gain amounted to 1.4-2. The first demonstration of an alternative concept of a laser plasma raget for EUVL was performed, based on the usage of a centrufugal force for elimination of particluates. The principle of the approach is generation of laser plasmas at the edge of a fastly-rotating disc. The effect of re- direction of particulates was observed in experiments with a (phi) 50 mm Ta disc at 36.000 rpm at laser power densitites between 109 and 1011 W/cm2.

Paper Details

Date Published: 18 September 1995
PDF: 9 pages
Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220971
Show Author Affiliations
Leonid A. Shmaenok, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)and A.F. Ioffe Physical-Technical Institute (Russia)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
C. Bruineman, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
R. K. F. Bastiaensen, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Alexander P. Shevelko, P.N. Lebedev Physical Insitute (Russia)
Dmitrii M. Simanovski, A.F. Ioffe Physical-Technical Institute (Russia)
A. N. Gladskikh, A.F. Ioffe Physical-Technical Institute (Russia)
Sergei V. Bobashev, A.F. Ioffe Physical-Technical Institute (Russia)


Published in SPIE Proceedings Vol. 2523:
Applications of Laser Plasma Radiation II
Martin C. Richardson; George A. Kyrala, Editor(s)

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