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EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?
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Paper Details

Date Published: 23 October 2015
PDF: 7 pages
Proc. SPIE 9635, Photomask Technology 2015, 963510 (23 October 2015); doi: 10.1117/12.2208944
Show Author Affiliations
Yoshinori Nagaoka, KLA-Tencor Japan Ltd. (Japan)
Junji Miyazaki, ASML Japan Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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