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Proceedings Paper

Research on the shape error from the Gaussian moth-eye antireflection microstructure elements made by the laser interference lithography technology
Author(s): Tingting Dong; Yuegang Fu; Lei Zhang; Chi Chen
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Paper Abstract

The contour shape of the Gaussian moth-eye antireflection microstructure elements is relied on the manufacturing method, the laser interference lithography technology, also effecting its’ reflectivity. This paper gives out the reflectance characteristics of the Gaussian moth-eye antireflection microstructure elements made on the monocrystalline silicon substrate at the mid-infrared with the method of RCWA. We analyzes the different influences on the reflectivity from the cycle, trench depth, wavelength and refractive index by the way of univariate. At last getting the result by MATLAB simulation: the reflectivity become least at the 1.7μm when the cycle between 1~3μm, about 0.05%; the largest reflectivity is about 14%, when the cycle is 1μm. Similarly, the trench depth has great influence on the reflectivity, the reflectance decreased and stabilized with growing of the trench depth. At the same time, the wavelength has influence on the reflectivity. These conclusions is beneficial to designing Gaussian moth-eye antireflection microstructure elements. The conclusion is got that when the angle of incidence different, the azimuth influences the reflectivity.

Paper Details

Date Published: 5 November 2015
PDF: 6 pages
Proc. SPIE 9795, Selected Papers of the Photoelectronic Technology Committee Conferences held June–July 2015, 97952X (5 November 2015); doi: 10.1117/12.2208870
Show Author Affiliations
Tingting Dong, Changchun Univ. of Science and Technology (China)
Yuegang Fu, Changchun Univ. of Science and Technology (China)
Lei Zhang, Changchun Univ. of Science and Technology (China)
Chi Chen, Huazhong Institute of Electro-Optics (China)


Published in SPIE Proceedings Vol. 9795:
Selected Papers of the Photoelectronic Technology Committee Conferences held June–July 2015
Shenggang Liu; Songlin Zhuang; Michael I. Petelin; Libin Xiang, Editor(s)

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