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Proceedings Paper

100-J UV laser for dynamic compression research
Author(s): J. Zweiback; S. F. Fochs; J. Bromage; D. Broege; R. Cuffney; Z. Currier; C. Dorrer; B. Ehrich; J. Engler; M. Guardalben; N. Kephalos; J. Marozas; R. Roides; J. Zuegel
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Paper Abstract

A 100-J, 351-nm laser has been developed for the Dynamic Compression Sector located at the Advanced Photon Source. This laser will drive shocks in solid-state materials which will be probed by picosecond x-ray pulses available from the synchrotron source. The laser utilizes a state-of-the-art fiber front end providing pulse lengths up to 20 ns with pulse shapes tailored to optimize shock trajectories. A diode-pumped Nd:glass regenerative amplifier is followed by a four-pass, flash-lamp-pumped rod amplifier. The regenerative amplifier is designed to produce up to 20 mJ with high stability. The final amplifier uses a six-pass, 15-cm, Nd:glass disk amplifier based on an OMEGA laser design. A KDP Type-II/Type-II frequency tripler configuration converts the 1053-nm laser output to a wavelength of 351 nm and the ultraviolet beam is image relayed to the target chamber. Smoothing by Spectral Dispersion and polarization smoothing have been optimized to produce uniform shocks in the materials to be tested. Custom control software collects all diagnostic information and provides a central location for all aspects of laser operation.

Paper Details

Date Published: 16 March 2016
PDF: 10 pages
Proc. SPIE 9726, Solid State Lasers XXV: Technology and Devices, 97260N (16 March 2016); doi: 10.1117/12.2208624
Show Author Affiliations
J. Zweiback, Logos Technologies, Inc. (United States)
S. F. Fochs, Univ. of Rochester (United States)
J. Bromage, Univ. of Rochester (United States)
D. Broege, Univ. of Rochester (United States)
R. Cuffney, Univ. of Rochester (United States)
Z. Currier, Logos Technologies, Inc. (United States)
C. Dorrer, Univ. of Rochester (United States)
B. Ehrich, Univ. of Rochester (United States)
J. Engler, Logos Technologies, Inc. (United States)
M. Guardalben, Univ. of Rochester (United States)
N. Kephalos, Logos Technologies, Inc. (United States)
J. Marozas, Univ. of Rochester (United States)
R. Roides, Univ. of Rochester (United States)
J. Zuegel, Univ. of Rochester (United States)


Published in SPIE Proceedings Vol. 9726:
Solid State Lasers XXV: Technology and Devices
W. Andrew Clarkson; Ramesh K. Shori, Editor(s)

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