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Proceedings Paper

Enhancement mechanism of fluorescence intensity in presence of plasmonic nanoparticles
Author(s): Sumana Das; Ramakrishna Vasireddi; Krishna Harika Villa; Brahmanandam Javvaji; Gopalkrishna M. Hegde; D. Roy Mahapatra
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Paper Abstract

The emission intensity of fluorophore molecule may change in presence of strong plasmon field induced by nanoparticles. The enhancement intensity is optimized through selective clustering or functionalization of nanoparticles in closed vicinity of fluorophore. Our study is aimed at understanding the enhancement mechanism of fluorescence intensity in presence of gold nanoparticles to utilize it in molecular sensing and in situ imaging in the microfluidic lab-on-chip device. Related phenomena are studied in situ in a microfluidic channel via fluorescence imaging. Detailed analysis is carried out to understand the possible mechanism of enhancement of fluorescence due to nanoparticles. In the present experimental study we show that SYTO9 fluorescence intensity increased in presence of Au nanoparticles of ~20 nm diameter. The fluorescence intensity is 20 time more compared to that in absence of Au nanoparticles. The enhancement of fluorescence intensity is attributed to the plasmonic resonance of Au nanoparticle at around the fluorescence emission wavelength. Underlying fundamental mechanism via dipole interaction model is explored for quantitative correlation of plasmonic enhancement properties.

Paper Details

Date Published: 9 December 2015
PDF: 6 pages
Proc. SPIE 9792, Biophotonics Japan 2015, 979208 (9 December 2015); doi: 10.1117/12.2207565
Show Author Affiliations
Sumana Das, Indian Institute of Science (India)
Ramakrishna Vasireddi, Indian Institute of Science (India)
Krishna Harika Villa, Indian Institute of Science (India)
Brahmanandam Javvaji, Indian Institute of Science (India)
Gopalkrishna M. Hegde, Indian Institute of Science (India)
D. Roy Mahapatra, Indian Institute of Science (India)


Published in SPIE Proceedings Vol. 9792:
Biophotonics Japan 2015
Takashige Omatsu; Yoshio Hayasaki; Yusuke Ogura; Yasuyuki Ozeki; Seigo Ohno, Editor(s)

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