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Proceedings Paper

Phase imaging results of phase defect using micro coherent EUV scatterometry microscope
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Paper Abstract

To evaluate defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a micro coherent EUV scatterometry microscope (micro-CSM). The illumination source is coherent EUV light with a 140-nm focus diameter on the defect using a Fresnel zoneplate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect is reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defect were well reconstructed quantitatively. The micro-CSM is very powerful tool to review an EUV phase defect.

Paper Details

Date Published: 9 November 2015
PDF: 7 pages
Proc. SPIE 9635, Photomask Technology 2015, 96351E (9 November 2015); doi: 10.1117/12.2205304
Show Author Affiliations
Tetsuo Harada, Univ. of Hyogo (Japan)
Hiraku Hashimoto, Univ. of Hyogo (Japan)
Tsuyoshi Amano, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hiroo Kinoshita, Univ. of Hyogo (Japan)
Takeo Watanabe, Univ. of Hyogo (Japan)

Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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