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Proceedings Paper

Actinic review of EUV masks: status and recent results of the AIMSTM EUV system
Author(s): Sascha Perlitz; Jan Hendrik Peters; Markus Weiss; Dirk Hellweg; Renzo Capelli; Krister Magnusson; Matt Malloy; Stefan Wurm
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Paper Abstract

Key enabler of the successful introduction of EUV lithography into volume production is the EUV mask infrastructure. For the production of defect free masks, actinic review of potential defect sites to decide on the need for repair or compensation is required. Also, the repair or compensation with the ZEISS MERiT electron beam repair tool needs actinic verification in a closed loop mask repair solution. For the realization of actinic mask review, ZEISS and the SEMATECH EUVL Mask Infrastructure consortium started a development program for an EUV aerial image metrology system, the AIMSTM EUV, with realization of a prototype tool. The development and prototype realization of the AIMSTM EUV has entered the tool calibration and qualification phase utilizing the achieved capabilities of EUV aerial image acquisition and EUV mask handling. In this paper, we discuss the current status of the prototype qualification and show recent measurement results.

Paper Details

Date Published: 9 November 2015
PDF: 7 pages
Proc. SPIE 9635, Photomask Technology 2015, 96351D (9 November 2015); doi: 10.1117/12.2205054
Show Author Affiliations
Sascha Perlitz, Carl Zeiss SMT GmbH (Germany)
Jan Hendrik Peters, Carl Zeiss SMT GmbH (Germany)
Markus Weiss, Carl Zeiss SMT GmbH (Germany)
Dirk Hellweg, Carl Zeiss SMT GmbH (Germany)
Renzo Capelli, Carl Zeiss SMT GmbH (Germany)
Krister Magnusson, Carl Zeiss SMT GmbH (Germany)
Matt Malloy, SUNY Poly SEMATECH (United States)
Stefan Wurm, SUNY Poly SEMATECH (United States)


Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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