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Proceedings Paper

Output features of two types of diode-pumped alkali vapor lasers in time domain
Author(s): He Cai; You Wang; Zhigang Jiang; Ming Gao; Juhong Han; Guofei An; Liangping Xue; Wei Zhang; Hongyuan Wang; Jie Zhou
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Paper Abstract

Diode-pumped alkali lasers (DPALs) have gained rapid development in the recent years due to their great potential for realization of high-power lasers. Relaxation oscillation (RO) is a common phenomenon related to the dynamic process in time domain. Generally, the generation of spikes in RO may affect the output stabilization of a DPAL. In this paper, we develop a kinetic model to investigate the output characteristics in time domain. Using such a mathematical model, a comparative study on the RO features of a diode-pumped rubidium vapor lasers (DPRVL) and a diode-pumped cesium vapor lasers (DPCVL) is theoretically carried out with different physical parameters including the cell temperature, buffer gas pressure, pumping power and reflectance of an output coupler. The analyses should be valuable for design of a steady high-powered DPAL.

Paper Details

Date Published: 15 October 2015
PDF: 9 pages
Proc. SPIE 9671, AOPC 2015: Advances in Laser Technology and Applications, 967116 (15 October 2015); doi: 10.1117/12.2199806
Show Author Affiliations
He Cai, Southwest Institute of Technical Physics (China)
You Wang, Southwest Institute of Technical Physics (China)
Zhigang Jiang, Southwest Institute of Technical Physics (China)
Ming Gao, Southwest Institute of Technical Physics (China)
Juhong Han, Southwest Institute of Technical Physics (China)
Guofei An, Southwest Institute of Technical Physics (China)
Liangping Xue, Southwest Institute of Technical Physics (China)
Wei Zhang, Southwest Institute of Technical Physics (China)
Hongyuan Wang, Southwest Institute of Technical Physics (China)
Jie Zhou, Southwest Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 9671:
AOPC 2015: Advances in Laser Technology and Applications
Shibin Jiang; Lijun Wang; Chun Tang; Yong Cheng, Editor(s)

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