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Proceedings Paper

Challenges and requirements of mask data processing for multi-beam mask writer
Author(s): Jin Choi; Dong Hyun Lee; Sinjeung Park; SookHyun Lee; Shuichi Tamamushi; In Kyun Shin; Chan Uk Jeon
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Paper Abstract

To overcome the resolution and throughput of current mask writer for advanced lithography technologies, the platform of e-beam writer have been evolved by the developments of hardware and software in writer. Especially, aggressive optical proximity correction (OPC) for unprecedented extension of optical lithography and the needs of low sensitivity resist for high resolution result in the limit of variable shaped beam writer which is widely used for mass production. The multi-beam mask writer is attractive candidate for photomask writing of sub-10nm device because of its high speed and the large degree of freedom which enable high dose and dose modulation for each pixel. However, the higher dose and almost unlimited appetite for dose modulation challenge the mask data processing (MDP) in aspects of extreme data volume and correction method. Here, we discuss the requirements of mask data processing for multi-beam mask writer and presents new challenges of the data format, data flow, and correction method for user and supplier MDP tool.

Paper Details

Date Published: 9 July 2015
PDF: 17 pages
Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580C (9 July 2015); doi: 10.1117/12.2199274
Show Author Affiliations
Jin Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Dong Hyun Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sinjeung Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
SookHyun Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Shuichi Tamamushi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
In Kyun Shin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9658:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
Nobuyuki Yoshioka, Editor(s)

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