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Proceedings Paper

A fully model-based MPC solution including VSB shot dose assignment and shape correction
Author(s): Ingo Bork; Peter Buck; Murali Reddy; Bhardwaj Durvasula
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Paper Abstract

The value of using multiple dose levels for individual shots on VSB (Variable Shaped Beam) mask writers has been demonstrated earlier [1][2]. The main advantage of modulating dose on a per shot basis is the fact that higher dose levels can be used selectively for critical features while other areas of the mask with non-critical feature types can be exposed at lower dose levels. This reduces the amount of backscattering and mask write time penalty compared to a global overdose-undersize approach.

While dose assignment to certain polygons or parts of polygons (VSB shots) can easily be accomplished via DRC rules on layers with limited shape variations like contact or VIA layers, it can be challenging to come up with consistent rules for layers consisting of a very broad range of shapes, generally found on metal layers.

This work introduces a method for fully model-based modulation of shot dose for VSB machines supporting between two and eight dose levels and demonstrates results achieved with this method.

Paper Details

Date Published: 23 October 2015
PDF: 8 pages
Proc. SPIE 9635, Photomask Technology 2015, 96350U (23 October 2015); doi: 10.1117/12.2199157
Show Author Affiliations
Ingo Bork, Mentor Graphics Corp. (United States)
Peter Buck, Mentor Graphics Corp. (United States)
Murali Reddy, Mentor Graphics Pvt. Ltd. (India)
Bhardwaj Durvasula, Mentor Graphics Pvt. Ltd. (India)

Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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