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Proceedings Paper

DUV inspection tool application for beyond optical resolution limit pattern
Author(s): Hiromu Inoue; Nobutaka Kikuiri; Hideo Tsuchiya; Riki Ogawa; Ikunao Isomura; Takashi Hirano; Ryoji Yoshikawa
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Paper Abstract

Mask inspection tool with DUV laser source has been used for Photo-mask production in many years due to its high sensitivity, high throughput, and good CoO. Due to the advance of NGL technology such as EUVL and Nano-imprint lithography (NIL), there is a demand for extending inspection capability for DUV mask inspection tool for the minute pattern such as hp4xnm or less. But current DUV inspection tool has sensitivity constrain for the minute pattern since inspection optics has the resolution limit determined by the inspection wavelength and optics NA.

Based on the unresolved pattern inspection capability study using DUV mask inspection tool NPI-7000 for 14nm/10nm technology nodes, we developed a new optical imaging method and tested its inspection capability for the minute pattern smaller than the optical resolution. We confirmed the excellent defect detection capability and the expendability of DUV optics inspection using the new inspection method. Here, the inspection result of unresolved hp26/20nm pattern obtained by NPI-7000 with the new inspection method is descried.

Paper Details

Date Published: 23 October 2015
PDF: 7 pages
Proc. SPIE 9635, Photomask Technology 2015, 96350R (23 October 2015); doi: 10.1117/12.2197890
Show Author Affiliations
Hiromu Inoue, NuFlare Technology, Inc. (Japan)
Nobutaka Kikuiri, NuFlare Technology, Inc. (Japan)
Hideo Tsuchiya, NuFlare Technology, Inc. (Japan)
Riki Ogawa, NuFlare Technology, Inc. (Japan)
Ikunao Isomura, NuFlare Technology, Inc. (Japan)
Takashi Hirano, Toshiba Corp. (Japan)
Ryoji Yoshikawa, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

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