Share Email Print
cover

Proceedings Paper

Examination of phase retrieval algorithms for patterned EUV mask metrology
Author(s): Rene A. Claus; Yow-Gwo Wang; Antoine Wojdyla; Markus P. Benk; Kenneth A. Goldberg; Andrew R. Neureuther; Patrick P. Naulleau
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We evaluate the performance of several phase retrieval algorithms using through-focus aerial image measurements of patterned EUV photomasks. Patterns present a challenge for phase retrieval algorithms due to the high- contrast and strong diffraction they produce. For this study, we look at the ability to correctly recover phase for line-space patterns on an EUV mask with a TaN absorber and for an etched EUV multilayer phase shift mask. The recovered phase and amplitude extracted from measurements taken using the SHARP EUV microscope at Lawrence Berkeley National Laboratory is compared to rigorous, 3D electromagnetic simulations. The impact of uncertainty in background intensity, coherence, and focus on the recovered field is evaluated to see if the algorithms respond differently.

Paper Details

Date Published: 3 November 2015
PDF: 10 pages
Proc. SPIE 9635, Photomask Technology 2015, 96350F (3 November 2015); doi: 10.1117/12.2197868
Show Author Affiliations
Rene A. Claus, Univ. of California, Berkeley (United States)
Yow-Gwo Wang, Univ. of California, Berkeley (United States)
Antoine Wojdyla, Lawrence Berkeley National Lab. (United States)
Markus P. Benk, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Andrew R. Neureuther, Univ. of California, Berkeley (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 9635:
Photomask Technology 2015
Naoya Hayashi, Editor(s)

© SPIE. Terms of Use
Back to Top