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Proceedings Paper

Thickness measurement of low reflectance optical thin film with transparent substrate
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Paper Abstract

Because of the substrate back reflectance phenomena, the reflectance of optical thin film stack on a transparent substrate is totally different from that of on an opaque substrate. In this paper, a method for the measurement of low reflectance optical film thickness that has substrate back reflectance is proposed for the first time. Through the analysis of the actual substrate back reflectance, a compensation model is introduced to reduce the influence of substrate back reflectance. The experimental results show good fitting precision and proves that this model can be used directly for the measurement of the optical film thickness with substrate back reflectance, and no extra process is needed.

Paper Details

Date Published: 8 October 2015
PDF: 7 pages
Proc. SPIE 9677, AOPC 2015: Optical Test, Measurement, and Equipment, 96770K (8 October 2015); doi: 10.1117/12.2197726
Show Author Affiliations
Guo Xia, Zhejiang Univ. (China)
Qianshun Liu, Zhejiang Univ. (China)
Haiyang Zhou, Zhejiang Univ. (China)
Feihong Yu, Zhejiang Univ. (China)

Published in SPIE Proceedings Vol. 9677:
AOPC 2015: Optical Test, Measurement, and Equipment
Sen Han; Jonathan D. Ellis; Junpeng Guo; Yongcai Guo, Editor(s)

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